Stochastic simulation of pattern formation in EUV resists with photo-decomposable quenchers [invited]

講演情報

Computational / Analytical Approach for Lithography Processes

2022年6月30日(木) 09:00 〜 11:30 Computational / Analytical Approach for Lithography Processes (A4)

Chairman:Tomoki Nagai(JSR Corporation), Takahiro Kozawa(Osaka University)

10:30 〜 11:00

Kyohei Imai¹, Bunta Inoue¹, Yoshihiko Hirai¹, *Masaaki Yasuda¹ (1. Osaka Metropolitan University)