ポスターセッション

[P] P16~P19

Tue. Sep 15, 2020 9:00 AM - 11:00 AM ZoomRm.Poster

+Add all to schedule

[P16] Relationship stacking faults amounts and hardness of epitaxial Cr (N,O) thin films

*Yusuke IWASAKI¹, Tadachika NAKAYAMA¹, Hisayuki SUEMATSU¹, Tsuneo SUZUKI¹ (1. Nagaoka Univ. Tech.)

[P17] Selection of buffer thin film for superior epitaxial chromium nitride thin film deposition

*Junya NITTA¹, Takumi SUGAI¹, Tadachika NAKAYAMA¹, Hisayuki SUEMATSU¹, Tsuneo SUZUKI¹ (1. Nagaoka Univ. Tech.)

[P18] Electrical conductivity in epitaxial (Cr,Fe)N thin films

*takumi SUGAI¹, junya NITTA¹, tadachika NAKAYAMA¹, Hisayuki SUEMATSU¹, Tsuneo SUZUKI¹ (1. Nagaoka Univ. Tech)

[P19] O₃ Generation on Tin-oxide Electrode Surfaces with On-Line Electrochemical Mass Spectrometry (OLEMS)

*Hiroyuki KASUMI¹, TAKAFUMI KANAUCHI¹, NAOTO TODOROKI¹, TOMOHIRO ISHII², SATORU MATSUMOTO², YOSUKE IMAI², TOSHIMASA WADAYAMA¹ (1. Tohoku Univ., 2. ISHIFUKU Metal Industry Co.)

ポスターセッション

[P] P54~P58

Tue. Sep 15, 2020 11:10 AM - 1:10 PM ZoomRm.Poster

+Add all to schedule

[P54] Diffusion properties of light-element impurities along the grain boundary of α-Al₂O₃

*Ryota Bamba¹, Yuji Kunisada², Norihito Sakaguchi² (1. Grad. School of Eng., Hokkaido Univ., 2. Faculty of Eng., Hokkaido Univ.)

[P55] TiN deposits coating formed by plasma nitriding using Ti screens with various open hole state

*KOUDAI IMAMURA¹, AKIO NISHIMOTO¹ (1. Grad. Sch. Sci & Eng., Kansai Univ.)

[P56] Fabrication of Mn-doped InN Films Deposited by Glancing-angle Reactive Evaporation

*Daisuke HOSHI¹, Ryouhei OOZEKI¹, Yasushi INOUE¹, Osamu TAKAI² (1. Chiba Inst.Technol., 2. Kanto Gakuin Univ.)

[P57] Fabrication and Hardness of Multilayers Prepared Using Trivalent Chromium-based Dual Bath Electrodeposition

*Yoshimi NAKATA¹, Yoshihisa KANEKO¹, Makoto UCHIDA¹ (1. Osaka City Univ.)

[P58] Preparation of Ni-Au supported porous CeO_２ catalysts and hydrogen generation over the catalysts

*RYOTA KAMEO¹, AI NOZAKI², MASAO MORISHITA², HIROAKI YAMAMOTO², RYOSUKE FUJIWARA¹ (1. Univ. of hyogo, 2. Univ. of hyogo)

ポスターセッション

[P] P84~P88

Tue. Sep 15, 2020 1:20 PM - 3:20 PM ZoomRm.Poster

+Add all to schedule

[P84] Thickening of nitrided layer by two-step plasma nitriding from low temperature to high temperature

*Tomoki Utsunomiya¹, akio Nishimoto² (1. kansai university (graduate student), 2. kansai university)

[P85] Mechanical properties of Si-doped diamond-like carbon films

*Ryo SAGAYAMA¹, Akio NISHIMOTO² (1. 関西大理工 (院生)、2. 関西大)

[P86] Effect of semi-solid Electrolyte in Adsorption-induced Electrochromic Cell

*Kazuya MURATA¹, Daisuke HOSHI¹, Yasushi INOUE¹, Osamu TAKAI² (1. Chiba Inst. Technol., 2. Kanto Gakuin Univ.)

[P87] Reducing sulfur to improve thermal embrittlement in electrodeposited nickel using citric acid to control orientation

*Atsuya WATANABE¹, Yorinobu TAKIGAWA² (1. Osaka Prefecture Univ. Eng. (Grad. stdt.), 2. Osaka Prefecture Univ.)

[P88] Operando Measurement of NO-Reduction by Rh/ZrO₂-Based Model Catalyst for Automotive Gas Purification Using RS-HVEM Equipped with Mass Spectrometer

*atsushi MAEDE¹, hiromochi TANAKA², takuya SUGANUMA², sigeo ARAI³, tetsuo HIGUCHI⁴, syunsuke MUTO³ (1. Graduate School of Eng., Nagoya University, 2. Toyota Motor Corp., 3. IMaSS, Nagoya University, 4. JEOL Ltd.)

ポスターセッション

[P] P122~P125

Tue. Sep 15, 2020 3:30 PM - 5:30 PM ZoomRm.Poster

+Add all to schedule

[P122] Effect of stacking order on mechanical properties of multilayer DLC films

*Koki OKADA¹, Akio NISHIMOTO¹ (1. Kansai university)

[P123] Comparative investigation of mechanical properties of various multilayer DLC films deposited using C₂H₂ gas

*Yukio KOBAYASHI¹, Akio NISHIMOTO² (1. Grad. Sch. Sci & Eng., Kansai Univ., 2. Kansai Univ.)

[P124] Active screen plasma nitriding using double screen of Ti and SPCC

*Shun HAMASHIMA¹, Akio NISHIMOTO² (1. Kansai University(Graduate Student), 2. Kansai University)

[P125] Investigation of surface nanostructure change of WO₃ by chromic reaction

*Yuya HAYASHI¹, Yuki NAKAGAWA², Tamaki SHIBAYAMA² (1. Grad. School of Eng. Hokkaido Univ., 2. Faculty oh Eng. Hokkaido Univ.)

Sessions

5.Materials Chemistry » Materials Chemistry

[P] P16~P19

[P16] Relationship stacking faults amounts and hardness of epitaxial Cr (N,O) thin films

[P17] Selection of buffer thin film for superior epitaxial chromium nitride thin film deposition

[P18] Electrical conductivity in epitaxial (Cr,Fe)N thin films

[P19] O₃ Generation on Tin-oxide Electrode Surfaces with On-Line Electrochemical Mass Spectrometry (OLEMS)

[P] P54~P58

[P54] Diffusion properties of light-element impurities along the grain boundary of α-Al₂O₃

[P55] TiN deposits coating formed by plasma nitriding using Ti screens with various open hole state

[P56] Fabrication of Mn-doped InN Films Deposited by Glancing-angle Reactive Evaporation

[P57] Fabrication and Hardness of Multilayers Prepared Using Trivalent Chromium-based Dual Bath Electrodeposition

[P58] Preparation of Ni-Au supported porous CeO_２ catalysts and hydrogen generation over the catalysts

[P] P84~P88

[P84] Thickening of nitrided layer by two-step plasma nitriding from low temperature to high temperature

[P85] Mechanical properties of Si-doped diamond-like carbon films

[P86] Effect of semi-solid Electrolyte in Adsorption-induced Electrochromic Cell

[P87] Reducing sulfur to improve thermal embrittlement in electrodeposited nickel using citric acid to control orientation

[P88] Operando Measurement of NO-Reduction by Rh/ZrO₂-Based Model Catalyst for Automotive Gas Purification Using RS-HVEM Equipped with Mass Spectrometer

[P] P122~P125

[P122] Effect of stacking order on mechanical properties of multilayer DLC films

[P123] Comparative investigation of mechanical properties of various multilayer DLC films deposited using C₂H₂ gas

[P124] Active screen plasma nitriding using double screen of Ti and SPCC

[P125] Investigation of surface nanostructure change of WO₃ by chromic reaction

Authentication