[16p-A13-1~14] 7.3 Lithography

[16p-A13-8] Development of “Life extention of chamber”technology for ArF eximer lasers for semiconductor lithography tools

^○Hisakazu Katsuumi¹, Hiroyuki Ikeda¹, Takeshi Asayama¹, Hiroaki Tsushima¹, Takahito Kumazaki¹, Akihiko Kurosu¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton Inc.¹)

Keywords:エキシマレーザ