^○Naokatsu Ikegami¹, Akira Kojima², Takashi Yoshida³, Hideyuki Ohyi², Nobuyoshi Koshida¹, Masayoshi Esashi³ (Tokyo Univ. of Agri. & Tech¹, Crestec Corp², Tohoku Univ.³)

Break （3:30 PM - 3:45 PM）

3:45 PM - 4:00 PM

[16p-A13-8] Development of “Life extention of chamber”technology for ArF eximer lasers for semiconductor lithography tools

^○Hisakazu Katsuumi¹, Hiroyuki Ikeda¹, Takeshi Asayama¹, Hiroaki Tsushima¹, Takahito Kumazaki¹, Akihiko Kurosu¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton Inc.¹)

4:00 PM - 4:15 PM

[16p-A13-9] Development of high power ArF excimer laser(120W) for semiconductor lithography tools（Ⅲ）

^○Motoki Honda¹, Youichi Sasaki¹, Takahito Kumazaki¹, Hiroaki Tsushima¹, Akihiko Kurosu¹, Kouji Kakizaki¹, Takashi Matsunaga¹, Hakaru Mizoguchi¹ (Gigaphoton Inc¹)

4:15 PM - 4:30 PM

▲ [16p-A13-10] In situ Observation of Photoresist Dissolution 6

^○JuliusJoseph Santillan¹, Toshiro Itani¹ (EUVL Infrastructure Development Center¹)

4:30 PM - 4:45 PM

[16p-A13-11] Adhesion improvement of water-soluble inorganic resist on TaN layer

^○Hirohito Tanino¹, Tsubasa Fukui¹, Masato Yamaguchi¹, Kazuya Emura¹, Makoto Okada¹, Tetsuo Harada¹, Takeo Watanabe¹, Hiroo Kinoshita¹ (Univ. of Hyogo¹)

4:45 PM - 5:00 PM

△ [16p-A13-12] Chemical Reaction Analysis of EUV CA Resist using SR Absorption Spectroscopy

^○（M1）Kazuya Emura¹, Takeo Watanabe¹, Daiju Siono², Yuichi Haruyama¹, Yasuji Muramatu¹, Katsumi Ohmori², Kazufumi Sato², Tetsuo Harada¹, Hiroo Kinoshita¹ (Univ. of Hyogo¹, Tokyo Ohka²)

5:00 PM - 5:15 PM

△ [16p-A13-13] Development of high-reflective W/Si multilayer supermirror for soft X-ray grating

^○Masaki Kuki¹, Tetsuo Harada¹, Takeo Watanabe¹, Hiroo Kionoshita¹ (University of Hyogo¹)

5:15 PM - 5:30 PM

[16p-A13-14] Development of EUV-Scattering-Measurement System for EUV Optical Elements

^○Daichi Tsujikawa¹, Takahiro Fujino¹, Yusuke Tanaka¹, Tetsuo Harada¹, Takeo Watanabe¹, Hiroo Kinoshita¹ (Univ. of Hyogo¹)

Sessions

07. Beam Technology and Nanofabrication » 7.3 Lithography

[16p-A13-1~14] 7.3 Lithography

[16p-A13-1] [INVITED]Nanomechanics and its application to wavelength measurement

[16p-A13-2] Desktop Maskless Exposure System Utilizing a Projector with Liquid Crystal Display Panels

[16p-A13-3] Laser Delineation of Slit Patterns onto Fine Stainless-Steel Pipes

[16p-A13-4] Non-destructive Inspection of Patterns Formed on Inner Surface of Fine Pipes

[16p-A13-5] Fabrication of Concave Patterns Arrayed Densely in an Orthogonal Matrix

[16p-A13-6] Design and Creation of Three-Dimensional Nanomechancal Resonator for Improving Q Factor

[16p-A13-7] Active-Matrix nc-Si Electron Emitter Array for Massively Parallel Direct-Write EB System (III)