The 74th JSAP Autumn Meeting,2013

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Symposium » Challenge of next generation surface control on thehigh end semiconductor device in the industry

[16p-C11-1~12] Challenge of next generation surface control on thehigh end semiconductor device in the industry

Mon. Sep 16, 2013 1:00 PM - 5:15 PM C11 (TC3 2F-210)

2:30 PM - 2:45 PM

[16p-C11-5] Behavior of Particles in Supercritical Carbon Dioxid

○Hiroshi Sugawara1, Shin-ichiro Kawasaki2, Akira Suzuki2 (Organo Co.1, AIST2)

Keywords:超臨界,二酸化炭素,微粒子