The 74th JSAP Autumn Meeting,2013

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Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

[17a-C2-1~10] 8.4 Plasma etching

Tue. Sep 17, 2013 9:15 AM - 11:45 AM C2 (TC3 1F-102)

9:15 AM - 9:30 AM

△ [17a-C2-1] Analysis of SiN/SiO2 selectivity in fluorocarbon (FC)/hydrofluorocarbon (HFC) plasma etching

○(M2)Keita Miyake1, Michiro Isobe1, Masanaga Fukasawa2, Kazunori Nagahata2, Tetsuya Tatsumi2, Satoshi Hamaguchi1 (Osaka Univ.1, Sony corporation2)

Keywords:SiN,シミュレーション