Molecular Dynamics Simulation of Si Surface Oxidation Processes by Oxygen Gas cluster Ion Beams

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Tue. Sep 17, 2013 9:15 AM - 11:45 AM C2 (TC3 1F-102)

9:30 AM - 9:45 AM

^○Kohei Mizotani¹, Michiro Isobe¹, Satoshi Hamaguchi¹ (Osaka Univ.¹)

Keywords:ガスクラスタービーム