Surface reactions by Br+ ions incident at oblique angles and reaction product ions (SiBrx+) in HBr plasmas

Presentation information

Oral presentation

08. Plasma Electronics » 8.4 Plasma etching

Tue. Sep 17, 2013 9:15 AM - 11:45 AM C2 (TC3 1F-102)

10:00 AM - 10:15 AM

^○(M2)Yu Muraki¹, Hu Li¹, Tomoko Ito¹, Kazuhiro Karahashi¹, Masaaki Matsukuma², Satoshi Hamaguchi¹ (Osaka Univ.¹, TEL Technology Center Tsukuba²)

Keywords:エッチング,SI,HBr