Influence of Back Channel on the Characteristics of Amorphous InZnO Thin Film Transistors Fabricated by Solution Process

Presentation information

Oral presentation

Joint session K » Joint session K

Tue. Sep 17, 2013 1:30 PM - 6:15 PM B4 (TC2 1F-106)

5:30 PM - 5:45 PM

^○Yukihiro Osada¹, Yasuaki Ishikawa¹, Li Lu¹, Yukiharu Uraoka¹ (NAIST¹)

Keywords:酸化物半導体,液体プロセス,膜厚依存性