O2/Ni ratio dependence of structure and surface morphology in atmospheric pressure MOCVD grown NiO thin films

Presentation information

Oral presentation

Joint session K » Joint session K

Tue. Sep 17, 2013 1:30 PM - 6:15 PM B4 (TC2 1F-106)

2:15 PM - 2:30 PM

^○(M2)Teuku Muhammad Roffi¹, Kazuo Uchida¹, Shinji Nozaki¹ (Univ. of Electro-Communications¹)

Keywords:NiO,MOCVD