The 74th JSAP Autumn Meeting,2013

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Oral presentation

13. Semiconductors A (Silicon) » 13.2 Semiconductor surfaces

[18p-C1-1~13] 13.2 Semiconductor surfaces

Wed. Sep 18, 2013 1:00 PM - 4:30 PM C1 (TC3 1F-101)

4:00 PM - 4:15 PM

[18p-C1-12] Water nozzle design for batch-type silicon wafer wet cleaner

○Nobutaka Ono1, Hitoshi Habuka1, Akihiro Goto2 (Yokohama Nat.Univ.1, Pre-Tech2)

Keywords:湿式洗浄