The 74th JSAP Autumn Meeting,2013

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Symposium planned by Program Committee » Possibilities of reactive deposition process by high power impulse magnetron sputtering

[18p-C5-1~8] Possibilities of reactive deposition process by high power impulse magnetron sputtering

Wed. Sep 18, 2013 2:00 PM - 6:15 PM C5 (TC3 1F-115)

4:15 PM - 4:45 PM

[18p-C5-5] Industrial Applications of Carbon Films using High Power Pulse Magnetron Sputtering Process

○Masanori Hiratsuka1,2, Nakamori Hideki1 (Nanotec Corp.1, Tokyo Univ. of Science2)

Keywords:大電力パルススパッタ