[19a-C1-1~11] 8.2 Plasma measurements and diagnostics

△ [19a-C1-4] Instantaneous generation of many flaked particles in plasma etching equipment

^○Yuji Kasashima¹, Natsuko Nabeoka¹, Taisei Motomura¹, Fumihiko Uesugi¹ (AIST¹)

Keywords:パーティクル,プラズマエッチング