[19a-P5-1~14] 13.5 Si process technology

[19a-P5-7] Characteristics and Channel Grain Conditions of Crystalline Silicon Thin-Film Transistors Fabricated by Micro-Thermal-Plasma-Jet Crystallization

^○Shohei Hayashi^1,2, Yuji Fujita¹, Seiji Morisaki¹, Takahiro Kamikura¹, Shogo Yamamoto¹, Seiichiro Higashi¹ (Hiroshima Univ.¹, JSPS Research Fellow DC²)

Keywords:薄膜トランジスタ,結晶化,熱プラズマジェット