The 74th JSAP Autumn Meeting,2013

Presentation information

Poster presentation

14. Semiconductors B (Exploratory Materials, Physical Properties, Devices) » 14.3 Electron devices and Process technology

[19a-P7-1~14] 14.3 Electron devices and Process technology

Thu. Sep 19, 2013 9:30 AM - 11:30 AM P7 (Davis Memorial Auditorium)

9:30 AM - 11:30 AM

[19a-P7-10] Effect of Annealing on Contact Properties with TiSi2 Electrodes on AlGaN/GaN

Mari Okamoto1, Yoshihiro Matsukawa1, Kuniyuki Kakushima2, Yoshinori Kataoka2, Akira Nishiyama2, Nobuyuki Sugii2, Hiroshi Iwai1, Hitoshi Wakabayashi2, Kazuo Tsutsui1, Wataru Saito3, Kenji Natori1 (Tokyo Tech.FRC1, IGSSE2, Toshiba corp3)

Keywords:AlGaN GaN specific contact