The 74th JSAP Autumn Meeting,2013

Presentation information

Poster presentation

15. Crystal Engineering » 15.6 IV-group-based compounds

[19a-P9-1~10] 15.6 IV-group-based compounds

Thu. Sep 19, 2013 9:30 AM - 11:30 AM P9 (Davis Memorial Auditorium)

9:30 AM - 11:30 AM

[19a-P9-9] TLM Pattern Dependence of Low Ohmic Resistance Ni Silicide on n+ 4H-SiC by Partial Amorphousization

○(M1)DESILVA MILANTHA1, SHIN=ICHIRO KUROKI1, TADASHI SATO1, TAKAMARO KIKKAWA1 (HIROSHIMA UNIVERSITY1)

Keywords:SiC,オーミック