Si Etching with ClF<sub>3</sub> Neutral Cluster Beam from Multi-nozzle

Presentation information

Oral presentation

07. Beam Technology and Nanofabrication » 7.6 Ion beams

Thu. Sep 19, 2013 1:30 PM - 5:00 PM A12 (TC1 3F-316)

3:30 PM - 3:45 PM

^○Toshio Seki¹, Yoshino Yu², Takehiko Senoo², Kunihiko Koike², Takaaki Aoki¹, Jiro Matsuo¹ (Kyoto Univ.¹, Iwatani Corp.²)

Keywords:クラスター