The 74th JSAP Autumn Meeting,2013

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Oral presentation

13. Semiconductors A (Silicon) » 13.5 Si process technology

[19p-B4-1~21] 13.5 Si process technology

Thu. Sep 19, 2013 1:30 PM - 7:00 PM B4 (TC2 1F-106)

5:30 PM - 5:45 PM

[19p-B4-16] Electrical Characterization of SiO2 Films Deposited by RF Sputtering Using O2/Ar Mixture

○Kimihiko Imura1, Tatsuya Okada1, Koya Sugihara1, Kiyoharu Shimoda1, Takashi Noguchi1 (Univ. of the Ryukyu1)

Keywords:SiO2膜