[19p-B4-1~21] 13.5 Si process technology

[19p-B4-2] Characteristic Evaluation of fine TFTs Crystallized by Micro Thermal Plasma Jet Irradiation

^○Seiji Morisaki¹, Shohei Hayashi¹, Takahiro Kamikura¹, Shogo Yamamoto¹, Muneki Akazawa¹, Kohei Sakaike¹, Seiichiro Higashi¹ (Graduate School of Advanced Sciences of Matter, Hiroshima University¹)

Keywords:TFT,熱プラズマジェット,CMOS