[19p-B4-1~21] 13.5 Si process technology

▲ [19p-B4-20] Activation of Silicon Implanted with Dopant Atoms by Microwave Heating

^○(B)Tomohiko Nakamura¹, Satoshi Shigeno¹, Shinya Yoshidomi¹, Masahiko Hasumi¹, Toshiko Ishii¹, Toshiyuki Sameshima¹, Yutaka Inouchi², Masao Naito², Tomohisa Mizuno³ (TUAT¹, Nissin Ion Equipment Co.,Ltd.², Kanagawa Univ.³)

Keywords:不純物活性化,イオン注入