The 74th JSAP Autumn Meeting,2013

Presentation information

Print

Oral presentation

13. Semiconductors A (Silicon) » 13.5 Si process technology

[19p-B4-1~21] 13.5 Si process technology

Thu. Sep 19, 2013 1:30 PM - 7:00 PM B4 (TC2 1F-106)

6:45 PM - 7:00 PM

[19p-B4-21] Active dopant profiling of ultra shallow junction in Si substrate using SSRM (Ⅱ)

○Hidenori Osae1, Satoshi Abo1, Fujio Wakaya1, Toshiaki Iwamatsu2, Hidekazu Oda2, Mikio Takai1 (Center for Quantum Science and Technology under Extreme Conditions,Osaka University.1, Renesas Electronics Corporation.2)

Keywords:アニール