[19p-B4-1~21] 13.5 Si process technology

[19p-B4-8] Photoluminescence study on recrystallization of ultra shallow As implanted layer

^○Shuji Tagawa¹, Shoichirou Yamada¹, Gota Murai¹, Masahiro Yoshimoto¹, Yoo Woo Sik² (Kyoto Institute of Technology¹, WaferMasters,Inc.²)

Keywords:シリコン,極浅接合,ホトルミネセンス