Study of the cleaning solution to suppress the excess oxidation of the GaN surface

Yukihiro Tsuji

Presentation information

Oral presentation

14. Semiconductors B (Exploratory Materials, Physical Properties, Devices) » 14.3 Electron devices and Process technology

[20a-D7-1~11] 14.3 Electron devices and Process technology

Fri. Sep 20, 2013 9:00 AM - 12:00 PM D7 (MK 3F-302)

9:15 AM - 9:30 AM

[20a-D7-2] Study of the cleaning solution to suppress the excess oxidation of the GaN surface

^○Yukihiro Tsuji^1,2, Tsukuru Katsuyama¹, Akinobu Teramoto², Yasuyuki Shirai², Shigetoshi Sugawa², Tadahiro Ohmi² (Sumitomo Electric Industries, Ltd.¹, Tohoku Univ.²)

Keywords:GaN,XPS

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