[20p-B4-1~8] 13.5 Si process technology

[20p-B4-2] Ni silicidation rate in Si nanowires (1) Impact of the thermal history

^○Hiroki Yamashita¹, Yasuhiro Shikahama¹, Hiroki Kosugiyama¹, Shuichiro Hashimoto¹, Kohei Takei¹, Jing Sun¹, Takashi Matsukawa², Meishoku Masahara², Takanobu Watanabe¹ (Waseda Univ.¹, AIST²)

Keywords:ニッケルシリサイド,ナノワイヤ,熱履歴