Reduction of Schottky Barrier Height of Sn/n-Ge Contact

Akihiro Suzuki

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.5 Si process technology

[20p-B4-1~8] 13.5 Si process technology

Fri. Sep 20, 2013 1:00 PM - 3:00 PM B4 (TC2 1F-106)

2:15 PM - 2:30 PM

[20p-B4-6] Reduction of Schottky Barrier Height of Sn/n-Ge Contact

^○Akihiro Suzuki¹, Shunsuke Asaba¹, Jun Yokoi¹, Osamu Nakatsuka¹, Masashi Kurosawa^1,2, Mitsuo Sakashita¹, Noriyuki Taoka¹, Shigeaki Zaima¹ (Graduate School of Eng., Nagoya Univ.¹, JSPS Research Fellow²)

Keywords:Sn

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