[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-10] △Analysis of Polymer Formation Processes in SiN Etching by Hydrofluorocarbon (HFC) plasmas

^○（M1）Keita Miyake¹, Michiro Isobe¹, Masanaga Fukasawa², Tetsuya Tatsumi², Satoshi Hamaguchi¹ (Osaka Univ.¹, Sony corporation²)

Keywords:SiN、シミュレーション