The 60th JSAP Spring Meeting,2013

Presentation information

Regular sessions(Oral presentation)

08. Plasma Electronics » 8.4 Plasma etching

[27p-A3-1~17] 8.4 Plasma etching

Wed. Mar 27, 2013 1:30 PM - 6:00 PM A3 (K1 2F-201)

[27p-A3-12] △Analysis of Ta Sputtering by Energetic Ion Injections at Oblique Angles for the Assessment of Ta-mask Profile Control

Hu Li1, Kazuhiro Karahashi1, Satoshi Hamaguchi1 (Graduate School of Engineering, Osaka Univ.1)

Keywords:エッチング