[27p-A3-1~17] 8.4 Plasma etching

[27p-A3-12] △Analysis of Ta Sputtering by Energetic Ion Injections at Oblique Angles for the Assessment of Ta-mask Profile Control

^○Hu Li¹, Kazuhiro Karahashi¹, Satoshi Hamaguchi¹ (Graduate School of Engineering, Osaka Univ.¹)

Keywords:エッチング