[27p-A7-1~17] 8.3 Plasma deposition of thin film and surface treatment

[27p-A7-13] Controllability of Plasma Enhanced Reactive Sputtering Process for Formation of Semiconductor Thin Films

Yuichi Setsuhara¹, ^○Kosuke Takenaka¹, Hirofumi Otani¹, Atsuki Kanai¹, Akinori Ebe² (Osaka Univ.¹, EMD Corp.²)

Keywords:プラズマ支援反応性スパッタリング