[27p-A7-1~17] 8.3 Plasma deposition of thin film and surface treatment

[27p-A7-14] Plasma potential control in magnetron sputtering deposition (II)

Takuya Umahashi¹, ^○Takeo Nakano¹, Shigeru Baba¹ (Seikei Univ.¹)

Keywords:スパッタリング、プラズマ電位、薄膜構造制御