[27p-A7-1~17] 8.3 Plasma deposition of thin film and surface treatment

[27p-A7-8] △Investigation of property of μc-Si film fabricated by H radical-injection plasma CVD

^○Yusuke Abe¹, Keita Miwa¹, Atsushi Fukushima¹, Ya Lu¹, Keigo Takeda¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya Univ.¹)

Keywords:微結晶シリコン、プラズマ化学気相堆積法、薄膜シリコン太陽電池