[27p-F2-1~15] 6.3 Oxide-based electronics

[27p-F2-14] Development of Sputtering Technology of Ta₂O₅/TaO_x Stacked Film for ReRAM Mass-Production

^○Natsuki Fukuda¹, Kazunori Fukuju¹, Yutaka Nishioka¹, Koukou Suu¹ (ULVAC Inc.¹)

Keywords:ReRAM、抵抗変化型メモリ、Sputtering