The 60th JSAP Spring Meeting,2013

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Regular sessions(Poster presentation)

13. Semiconductors A (Silicon) » 13.5 Si process technology

[27p-PB4-1~16] 13.5 Si process technology

Wed. Mar 27, 2013 1:30 PM - 3:30 PM PB4 (2nd gymnasium)

[27p-PB4-12] Comparative study of Schottky barrier height modulation in S-introduced NiGe/Ge and NiSi/Si junctions

○Masahiro Koike1, Yuuichi Kamimuta1, Tsutomu Tezuka1 (GNC, AIST1)

Keywords:半導体、硫黄、ショットキー