[27p-PB4-1~16] 13.5 Si process technology

[27p-PB4-13] Evaluation of electrical activation of impurities segregated at Ni-silicide/Si Schottky junction interface

^○Kohei Akita¹, Yohei Miyata¹, Kazuma Terayama¹, Masanori Takei¹, Kazuo Tsutsui¹, Hiroshi Nohira², Kuniyuki Kakushima¹, Ahmet Parlhat¹, Takeo Hattori¹, Hiroshi Iwai¹ (Tokyo Inst.¹, Tokyo City.²)

Keywords:活性化