[28a-G2-1~12] 13.3 Insulator technology

[28a-G2-5] Detection of Oxidation-Induced Residual Stress in Si(100) Substrate by PES

^○Tomoyuki Suwa¹, Akinobu Teramoto¹, Tadahiro Ohmi¹, Takayuki Muro², Toyohiko Kinoshita², Kohki Nagata³, Atsushi Ogura³, Takeo Hattori¹ (Tohoku Univ.¹, JASRI², Meiji Univ.³)

Keywords:シリコン、歪、光電子分光