[28p-G6-1~17] 13.5 Si process technology

[28p-G6-15] △Double-Layered Polycrystalline Silicon Thin Films Crystallized by CO2 Laser Annealing for Three-Dimensional Integrated Devices

^○（DC）Koji Yamasaki¹, Emi Machida¹, Masahiro Horita^1,2, Yasuaki Ishikawa^1,2, Yukiharu Uraoka^1,2, Hiroshi Ikenoue³ (NAIST¹, CREST², Kyushu Univ.³)

Keywords:laser