[28p-G6-1~17] 13.5 Si process technology

[28p-G6-3] Investigation of hydrogen radical source on decomposition of chlorosilane source materials

^○Makoto Kubota^1,2, Naoki Ikeda^1,2, Hideomi Koinuma³, Takamasa Ishigaki², Masatomo Sumiya¹ (NIMS¹, Hosei Univ.², Tokyo Univ.³)

Keywords:水素ラジカル、熱フィラメント法、シリコン