[28p-G6-1~17] 13.5 Si process technology

[28p-G6-4] Effect of surface treatment on Si before SiO₂ deposition by plasma-enhanced chemical vapor deposition

^○Tomohito Kawashima¹, Junji Kataoka¹, Hidehiko Yabuhara¹ (Corporate Manufacturing Engineering Center, Toshiba Corporation¹)

Keywords:プラズマCVD