[29a-G7-1~11] 22.1Joint Session L "Basics and applications of MEMS, NEMS: Integration of diverse functionalities"

[29a-G7-1] Si chemical dry etching in NOx (x=1 or 2) / F2 gas mixture at elevated temperature

^○Satomi Tajima¹, Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (Nagoya U. PLANT¹)

Keywords:Si エッチング、ケミカルドライエッチング、温度依存