The 60th JSAP Spring Meeting,2013

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Regular sessions(Poster presentation)

13. Semiconductors A (Silicon) » 13.3 Insulator technology

[29p-PB1-1~20] 13.3 Insulator technology

Fri. Mar 29, 2013 1:30 PM - 3:30 PM PB1 (2nd gymnasium)

[29p-PB1-1] Thermal annealing effect on paramagnetic defects in silicon nitride films

○（M2）Naushad Shakoor1, Kokichi Ishikawa1, Kyoteru Kobayashi1 (Tokai University1)

Keywords:シリコン窒化膜、K0 センター、熱処理