Preparation of AlOx/SiOx structure by post-annealing of AlOx/Si precursor

Shozo Miyake

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Oral presentation

06. Thin Films and Surfaces » 6.4 New thin-film materials

[17p-A11-1~17] 6.4 New thin-film materials

Wed. Sep 17, 2014 1:15 PM - 6:00 PM A11 (E215)

4:15 PM - 4:30 PM

[17p-A11-12] Preparation of AlO_x/SiO_x structure by post-annealing of AlO_x/Si precursor

^○(M1)Shozo Miyake¹, Yuki Toyoshima¹, Yasushi Hotta^1,3, Haruhiko Yoshida^1,3, Koji Arafune^1,3, Atsushi Ogura^2,3, Shin-ichi Satoh^1,3 (Univ.of Hyogo¹, Meiji Univ.², JST-CREST³)

Keywords:high-k

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Presentation information

[17p-A11-1~17] 6.4 New thin-film materials

[17p-A11-12] Preparation of AlOx/SiOx structure by post-annealing of AlOx/Si precursor

[17p-A11-12] Preparation of AlO_x/SiO_x structure by post-annealing of AlO_x/Si precursor