[18a-A19-1~13] 13.3 Si Process・Interconnect・MEMS・Integration

[18a-A19-6] Bonding states and Fermi-level depinning of WSin/Ge junctions

^○Noriyuki Uchida¹, Naoya Okada^1,2, Takehide Miyazaki³, Kouichi Fukuda¹, Kanayama Toshihiko⁴ (NeRI-AIST¹, JST-PREST², NRI-AIST³, AIST⁴)

Keywords:Geコンタクト,フェルミレベルピニング解除,X線光電子分光