[19a-A17-1~12] 13.2 絶縁膜技術

▼ [19a-A17-1] Evidence for Si up-diffusion during scavenging of interfacial SiO₂ in HfO₂/SiO₂/Si stack

^○（D）李秀妍，矢嶋赳彬，西村知紀，長汐晃輔，鳥海明 (東大工)

キーワード：SiO2 Scavenging,Si diffusion,SiO desorption