[20a-A19-1~12] 13.3 Si Process・Interconnect・MEMS・Integration

[20a-A19-8] Minimal System of Micro-Plasma Etcher Equipment(III)

^○Hiroyuki Tanaka¹, Yoshiki Shimizu^1,2, Hisato Ogiso^1,2, Shizuka Nakano^1,2, Shunichiro Shinbori³, Maki Katohgi³, Satoshi Takahashi³, Yuya Shirayama³, Shuntaro Yokosuka³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (MINIMAL¹, AIST², SANYU³)

Keywords:ミニマル,マイクロプラズマ