[17a-D6-1~11] 6.2 Carbon-based thin films

△ [17a-D6-3] Structural change of hydrogenated amorphous carbon films using rf plasma CVD with application of pulsed bias voltage

^○Xiaolong Zhou¹, Keiji Komatsu¹, Ikumi Toda¹, Shigeo Ohshio¹, Hiroyuki Muratsu¹, Haruhiko Ito¹, Hidetoshi Saitoh¹ (Nagaoka Nniv. Tech.¹)

Keywords:水素化アモルファス炭素膜,構造変化