[17a-E11-6~10] 15.3 III-V-group epitaxial crystals

[17a-E11-9] Reduction of wafer curvature after growth using thin metamorphic buffer by in-situ wafer-curvature measurement

^○Ryo Nakao¹, Masakazu Arai¹, Ryuzo Iga¹, Masaki Kohtoku¹ (NTT Photonics Laboratories¹)

Keywords:メタモルフィック,その場測定,ウェハ曲率