[17p-D6-1~11] 6.2 Carbon-based thin films

[17p-D6-3] Characterization of a-C:Si:H Thin Films Fabricated by Low-energy Electron Beam Irradiation on Solid Thin Films formed from Hydrocarbon and Tetramethylsilane at Cryogenic Temperature

^○Ryutaro Yamada¹, Keita Seki¹, Nao Sakamaki¹, Naoki Kobayashi¹, Testuya Sato¹, Kiyokazu Nakagawa¹ (Univ. of Yamanashi¹)

Keywords:a-C,Si(CH3)4,極低温