[18a-D8-1~12] 13.2 絶縁膜技術

▲ [18a-D8-6] Effects of biaxially-tensile strain on properties of Si/SiO2 interface states generated by electrical stress

^○蔡偉立^1,2，竹中充^1,2，高木信一^1,2 (東大院工¹，JST CREST²)

キーワード：interface state