[18a-E14-1~10] 13.3 Si Process・Interconnect・MEMS・Integration

[18a-E14-3] Fabrication and evaluation of pyroelectric infrared sensor useing infrared absorption film SiON

^○Kazuki Oe¹, Shota Yonemaru¹, Koji Oishi¹, Daisuke Akai^1,2, Makoto Ishida^1,2 (Toyohashi Tech.¹, EIIRIS²)

Keywords:赤外線センサ,吸収膜