The 61st JSAP Spring Meeting, 2014

Presentation information

Oral presentation

13. Semiconductors A (Silicon) » 13.3 Si Process・Interconnect・MEMS・Integration

[18p-E14-1~21] 13.3 Si Process・Interconnect・MEMS・Integration

Tue. Mar 18, 2014 1:15 PM - 6:45 PM E14 (E302)

3:45 PM - 4:00 PM

[18p-E14-11] Pattern Size Dependence of Anisotropic Biaxial Stresses in Strained Si Using Surface Enhanced Raman Scattering

Ryuhei Iwasaki1, Kohki Nagata1, Daisuke Kosemura1, Atsushi Ogura1 (Meiji Univ.1)

Keywords:ラマン分光法,歪Si,表面プラズモン共鳴